IIT-Mandi has developed a new technology to deal with key problems causing deficiencies in manufacturing next generation IC chips.
The project to the design and develop photo-resists using extreme ultraviolet lithography (EUVL) was taken up by a team of scientists under Professor Kenneth Gonsalves.
Professor Gonsalves is working with an interdisciplinary team that includes Dr Subrata Ghosh and Dr Pradeep Parmeswaran of the School of Basic Sciences and Dr Satinder Sharma of the School of Computing and Electrical Engineering.
"In today's world, semiconductor chips play a vital role in our daily lives as they are at the core of modern computing and telecommunications and are also key to development of computer controlled and operated machinery," an IIT release said.
As semiconductor-device manufacturers compete to offer high performing, low heat generating and cost effective devices, there is an ongoing drive to reduce the IC feature size to 22 nm (nanometres), which boosts speed and lowers cost, the release said.
Extreme ultra-violet lithography (EUVL) is one of the more promising next-generation tools for achieving smaller feature sizes and is also cost effective, has higher unit throughput and simplified working," Dr Subrata Ghosh explained.
The project at IIT Mandi involves the design and development of photo-resists that are directly sensitive to photons and do not require chemical amplification with the problems that it introduces. The new resist design uses polymers that are prepared from monomers containing sulfonium groups, the release added.
Source: Press Trust of India